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2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers

XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
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    Buy cheap 2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers from wholesalers
     
    Buy cheap 2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers from wholesalers
    • Buy cheap 2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers from wholesalers

    2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers

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    Brand Name : PAM-XIAMEN
    Price : By Case
    Payment Terms : T/T
    Supply Ability : 10,000 wafers/month
    Delivery Time : 5-50 working days
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    2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers

    2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers

    PAM-XIAMEN has established the manufacturing technology for freestanding (Gallium Nitride)GaN substrate wafer which is for UHB-LED and LD. Grown by hydride vapour phase epitaxy (HVPE) technology,Our GaN substrate has low defect density and less or free macro defect density.


    PAM-XIAMEN offers full range of GaN and Related III-N Materials including GaN substrates of various orientations and electrical conductivity,crystallineGaN&AlN templates, and custom III-N epiwafers.


    2inch Freestanding Si-GaN GaN Substrates

    ItemPAM-FS-GaN-50-SI
    Dimension50.8 ±1 mm
    Thickness350 ±25 μm 430±25μm
    OrientationC plane (0001) off angle toward M-axis 0.35 ±0.15°
    Orientation Flat(1-100) 0 ±0.5°, 16 ±1 mm
    Secondary Orientation Flat(11-20) 0 ±3°, 8 ±1 mm
    Conduction Type

    Semi-Insulating

    Resistivity (300K)

    >106 Ω·cm

    TTV≤ 15 μm
    BOW-20 μm ≤ BOW ≤ 20 μm
    Surface Roughness:

    Front side: Ra<0.2nm, epi-ready;

    Back side: Fine Ground or polished.

    Dislocation DensityFrom 1 x 105 to 5 x 10 6cm -2(calculated by CL)*
    Macro Defect Density< 2 cm-2
    Useable Area> 90% (edge and macro defects exclusion)
    Packageeach in single wafer container, under nitrogen atmosphere, packed in class 100 clean room

    Application of GaN Substrate

    Solid State Lighting:GaN devices are used as ultra high brightness light emitting diodes (LEDs), TVs, automobiles, and general lighting

    DVD Storage: Blue laser diodes

    Power Device: GaN devices are used as various components in high-power and high-frequency power electronics like cellular base stations, satellites, power amplifiers, and inverters/converters for electric vehicles (EV) and hybrid electric vehicles (HEV). GaN’s low sensitivity to ionizing radiation (like other group III nitrides) makes it a suitable material for spaceborne applications such as solar cell arrays for satellites and high-power, high-frequency devices for communication, weather, and surveillance satellites

    Wireless Base Stations: RF power transistors

    Wireless Broadband Access: high frequency MMICs,RF-Circuits MMICs

    Pressure Sensors:MEMS

    Heat Sensors: Pyro-electric detectors

    Power Conditioning: Mixed signal GaN/Si Integration

    Automotive Electronics: High temperature electronics

    Power Transmission Lines: High voltage electronics

    Frame Sensors: UV detectors

    Solar Cells:GaN’s wide band gap covers the solar spectrum from 0.65 eV to 3.4 eV (which is practically the entire solar spectrum), making indium gallium nitride

    (InGaN) alloys perfect for creating solar cell material. Because of this advantage, InGaN solar cells grown on GaN substrates are poised to become one of the most important new applications and growth market for GaN substrate wafers.

    Ideal for HEMTs, FETs

    GaN Schottky diode project: We accept custom spec of Schottky diodes fabricated on the HVPE-grown, free-standing gallium nitride (GaN) layers of n- and p-types.

    Both contacts (ohmic and Schottky) were deposited on the top surface using Al/Ti and Pd/Ti/Au.

    Zinc Blende crystal structure
    RemarksReferens
    Energy gaps, Eg3.28 eV0 KBougrov et al. (2001)
    Energy gaps, Eg3.2 eV300 K
    Electron affinity4.1 eV300 K
    Conduction band
    Energy separation between Γ valley and X valleys EΓ1.4 eV300 KBougrov et al. (2001)
    Energy separation between Γ valley and L valleys EL1.6 ÷ 1.9 eV300 K
    Effective conduction band density of states1.2 x 1018 cm-3300 K
    Valence band
    Energy of spin-orbital splitting Eso0.02 eV300 K
    Effective valence band density of states4.1 x 1019 cm-3300 K

    Band structure for Zinc Blende GaN

    Band structure of zinc blende(cubic) GaN. Important minima of the conduction band and maxima of the valence band.
    300K; Eg=3.2 eVeV; EX= 4.6 eV; EL= 4.8-5.1 eV; Eso = 0.02 eV
    For details see Suzuki, Uenoyama & Yanase (1995) .


    Brillouin zone of the face centered cubic lattice, the Bravais lattice of the diamond and zincblende structures.

    Quality 2 Inch Freestanding Si-GaN GaN(Gallium Nitride) Substrates And Wafers for sale
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