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4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size

XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
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    Buy cheap 4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size from wholesalers
     
    Buy cheap 4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size from wholesalers
    • Buy cheap 4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size from wholesalers

    4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size

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    Brand Name : PAM-XIAMEN
    Price : By Case
    Payment Terms : T/T
    Supply Ability : 10,000 wafers/month
    Delivery Time : 5-50 working days
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    4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size

    4H High Purity Semi Insulating SiC Wafer , Research Grade , Epi Ready , 2”Size


    PAM-XIAMEN offers semiconductor silicon carbide wafers,6H SiC and 4H SiC in different quality grades for researcher and industry manufacturers. We has developed SiC crystal growth technology and SiC crystal wafer processing technology,established a production line to manufacturer SiCsubstrate,Which is applied in GaNepitaxydevice,powerdevices,high-temperature device and optoelectronic Devices. As a professional company invested by the leading manufacturers from the fields of advanced and high-tech material research and state institutes and China’s Semiconductor Lab,weare devoted to continuously improve the quality of currently substrates and develop large size substrates.

    Here shows detail specification:


    SILICON CARBIDE MATERIAL PROPERTIES


    PolytypeSingle Crystal 4HSingle Crystal 6H
    Lattice Parametersa=3.076 Åa=3.073 Å
    c=10.053 Åc=15.117 Å
    Stacking SequenceABCBABCACB
    Band-gap3.26 eV3.03 eV
    Density3.21 · 103 kg/m33.21 · 103 kg/m3
    Therm. Expansion Coefficient4-5×10-6/K4-5×10-6/K
    Refraction Indexno = 2.719no = 2.707
    ne = 2.777ne = 2.755
    Dielectric Constant9.69.66
    Thermal Conductivity490 W/mK490 W/mK
    Break-Down Electrical Field2-4 · 108 V/m2-4 · 108 V/m
    Saturation Drift Velocity2.0 · 105 m/s2.0 · 105 m/s
    Electron Mobility800 cm2/V·S400 cm2/V·S
    hole Mobility115 cm2/V·S90 cm2/V·S
    Mohs Hardness~9~9

    4H High Purity Semi Insulating Silicon Carbide Wafer, Dummy Grade,Epi Ready,2”Size


    SUBSTRATE PROPERTYS4H-51-SI-PWAM-250 S4H-51-SI-PWAM-330 S4H-51-SI-PWAM-430
    Description

    Research Grade4H SEMI Substrate

    Polytype4H
    Diameter(50.8 ± 0.38) mm
    Thickness(250 ± 25) μm (330 ± 25) μm (430 ± 25) μm
    Resistivity (RT)>1E5 Ω·cm
    Surface Roughness< 0.5 nm (Si-face CMP Epi-ready); <1 nm (C- face Optical polish)
    FWHM<50 arcsec
    Micropipe DensityA+≤1cm-2 A≤10cm-2 B≤30cm-2 C≤50cm-2 D≤100cm-2
    Surface Orientation
    On axis <0001>± 0.5°
    Off axis 3.5° toward <11-20>± 0.5°
    Primary flat orientationParallel {1-100} ± 5°
    Primary flat length16.00 ± 1.70 mm
    Secondary flat orientation Si-face:90° cw. from orientation flat ± 5°
    C-face:90° ccw. from orientation flat ± 5°
    Secondary flat length8.00 ± 1.70 mm
    Surface FinishSingle or double face polished
    PackagingSingle wafer box or multi wafer box
    Usable area≥ 90 %
    Edge exclusion1 mm

    Single crystal SiC Properties

    Here we compare property of Silicon Carbide, including Hexagonal SiC,CubicSiC,Single crystal SiC.

    Property of Silicon Carbide (SiC)

    Comparision of Property of Silicon Carbide, including Hexagonal SiC,Cubic SiC,Single crystal SiC:

    PropertyValueConditions
    Density3217 kg/m^3hexagonal
    Density3210 kg/m^3cubic
    Density3200 kg/m^3Single crystal
    Hardness,Knoop(KH)2960 kg/mm/mm100g,Ceramic,black
    Hardness,Knoop(KH)2745 kg/mm/mm100g,Ceramic,green
    Hardness,Knoop(KH)2480 kg/mm/mmSingle crystal.
    Young's Modulus700 GPaSingle crystal.
    Young's Modulus410.47 GPaCeramic,density=3120 kg/m/m/m, at room temperature
    Young's Modulus401.38 GPaCeramic,density=3128 kg/m/m/m, at room temperature
    Thermal conductivity350 W/m/KSingle crystal.
    Yield strength21 GPaSingle crystal.
    Heat capacity1.46 J/mol/KCeramic,at temp=1550 C.
    Heat capacity1.38 J/mol/KCeramic,at temp=1350 C.
    Heat capacity1.34 J/mol/KCeramic,at temp=1200 C.
    Heat capacity1.25 J/mol/KCeramic,at temp=1000 C.
    Heat capacity1.13 J/mol/KCeramic,at temp=700 C.
    Heat capacity1.09 J/mol/KCeramic,at temp=540 C.
    Electrical resistivity1 .. 1e+10 Ω*mCeramic,at temp=20 C
    Compressive strength0.5655 .. 1.3793 GPaCeramic,at temp=25 C
    Modulus of Rupture0.2897 GPaCeramic,with 1 wt% B addictive
    Modulus of Rupture0.1862 GPaCeramifc,at room temperature
    Poisson's Ratio0.183 .. 0.192Ceramic,at room temperature,density=3128 kg/m/m/m
    Modulus of Rupture0.1724 GPaCeramic,at temp=1300 C
    Modulus of Rupture0.1034 GPaCeramic,at temp=1800 C
    Modulus of Rupture0.07586 GPaCeramic,at temp=1400 C
    Tensile strength0.03448 .. 0.1379 GPaCeramic,at temp=25 C

    *Reference:CRC Materials Science and Engineering Handbook

    Comparision of Property of single crystal SiC, 6H and 4H:

    PropertySingle Crystal 4HSingle Crystal 6H
    Lattice Parametersa=3.076 Åa=3.073 Å
    c=10.053 Åc=15.117 Å
    Stacking SequenceABCBABCACB
    Band-gap3.26 eV3.03 eV
    Density3.21 · 103 kg/m33.21 · 103 kg/m3
    Therm. Expansion Coefficient4-5×10-6/K4-5×10-6/K
    Refraction Indexno = 2.719no = 2.707
    ne = 2.777ne = 2.755
    Dielectric Constant9.69.66
    Thermal Conductivity490 W/mK490 W/mK
    Break-Down Electrical Field2-4 · 108 V/m2-4 · 108 V/m
    Saturation Drift Velocity2.0 · 105 m/s2.0 · 105 m/s
    Electron Mobility800 cm2/V·S400 cm2/V·S
    hole Mobility115 cm2/V·S90 cm2/V·S
    Mohs Hardness~9~9

    *Reference:Xiamen Powerway Advanced Material Co.,Ltd.

    Comparision of property of 3C-SiC,4H-SiC and 6H-SiC:

    Si-C Polytype3C-SiC4H-SiC6H-SiC
    Crystal structureZinc blende (cubic)Wurtzite ( Hexagonal)Wurtzite ( Hexagonal)
    Group of symmetryT2d-F43mC46v-P63mcC46v-P63mc
    Bulk modulus2.5 x 1012 dyn cm-22.2 x 1012 dyn cm-22.2 x 1012 dyn cm-2
    Linear thermal expansion coefficient2.77 (42) x 10-6 K-1  
    Debye temperature1200 K1300 K1200 K
    Melting point3103 (40) K3103 ± 40 K3103 ± 40 K
    Density3.166 g cm-33.21 g cm-33.211 g cm-3
    Hardness9.2-9.39.2-9.39.2-9.3
    Surface microhardness2900-3100 kg mm-22900-3100 kg mm-22900-3100 kg mm-2
    Dielectric constant (static)ε0 ~= 9.72The value of 6H-SiC dielectric constant is usually usedε0,ort ~= 9.66
    Infrared refractive index~=2.55~=2.55 (c axis)~=2.55 (c axis)
    Refractive index n(λ)n(λ)~= 2.55378 + 3.417 x 104·λ-2n0(λ)~= 2.5610 + 3.4 x 104·λ-2n0(λ)~= 2.55531 + 3.34 x 104·λ-2
    ne(λ)~= 2.6041 + 3.75 x 104·λ-2ne(λ)~= 2.5852 + 3.68 x 104·λ-2
    Radiative recombination coefficient1.5 x 10-12 cm3/s1.5 x 10-12 cm3/s
    Optical photon energy102.8 meV104.2 meV104.2 meV
    Effective electron mass (longitudinal)ml0.68mo0.677(15)mo0.29mo
    Effective electron mass (transverse)mt0.25mo0.247(11)mo0.42mo
    Effective mass of density of states mcd0.72mo0.77mo2.34mo
    Effective mass of the density of states in one valley of conduction band mc0.35mo0.37mo0.71mo
    Effective mass of conductivity mcc0.32mo0.36mo0.57mo
    Effective hall mass of density of state mv?0.6 mo~1.0 mo~1.0 mo
    Lattice constanta=4.3596 Aa = 3.0730 Aa = 3.0730 A
    b = 10.053b = 10.053

    * Reference: IOFFE

    SiC 4H and SiC 6H manufacturer reference:PAM-XIAMEN is the world’s leading developer of solid-state lighting technology,he offer a full line: Sinlge crystal SiC wafer and epitaxial wafer and SiC wafer reclaim


    Introduction

    Silicon carbide (SiC)-based semiconductor electronic devices and circuits are presently being developed
    for use in high-temperature, high-power, and high-radiation conditions under which conventional semiconductors
    cannot adequately perform. Silicon carbide’s ability to function under such extreme conditions
    is expected to enable significant improvements to a far-ranging variety of applications and systems.
    These range from greatly improved high-voltage switching for energy savings in public electric power
    distribution and electric motor drives to more powerful microwave electronics for radar and communications
    to sensors and controls for cleaner-burning more fuel-efficient jet aircraft and automobile
    engines. In the particular area of power devices, theoretical appraisals have indicated that SiC
    power MOSFET’s and diode rectifiers would operate over higher voltage and temperature ranges, have
    superior switching characteristics, and yet have die sizes nearly 20 times smaller than correspondingly
    rated silicon-based devices. However, these tremendous theoretical advantages have yet to be widely
    realized in commercially available SiC devices, primarily owing to the fact that SiC’s relatively immature
    crystal growth and device fabrication technologies are not yet sufficiently developed to the degree required
    for reliable incorporation into most electronic systems.
    This chapter briefly surveys the SiC semiconductor electronics technology. In particular, the differences
    (both good and bad) between SiC electronics technology and the well-known silicon VLSI technology
    are highlighted. Projected performance benefits of SiC electronics are highlighted for several large-scale
    applications. Key crystal growth and device-fabrication issues that presently limit the performance and
    capability of high-temperature and high-power SiC electronics are identified.

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